Penn State 3-D virtual tour: M600 MBE cluster system

Are you interested in exploring about our MBE-PVD cluster systems? Or see what makes the M600 system layout so good for MBE?

Why not take a 3D virtual tour of Roman Engel-Herbert’sPenn State University MBE laboratory?  You can even explore using your VR glasses if you have them!

M600 Penn State MBE Lab

DCAX-60 RF Atom Source

A gas plasma created by the DCAX-60 RF Atom Source, is an effective tool for conversion of highly stable source gases such as N2 or O2 to more active atomic and molecular species suitable for MBE growth of electronic materials. The DCAX-60 provides the stability and reproducibility required with a wide beam profile and no gas leakage for both Oxide/Nitride growth and low pressure Doping applications.  For growth applications typically a 37 x 0.5mm aperture pattern is suitable, whilst for doping applications, a 5 x 0.5mm pattern is best suited to enable growth of materials such as GaAsN. Depending on aperture pattern, the DCAX-60, can have up to a 50mm beam diameter, designed for large wafer sizes (>100mm). One piece discharge bulbs are available in Quartz, PBN and Alumina depending on application.

Benefits of using the  DCAX-60 for Oxide/Nitride MBE are:

Single unit discharge bulb
The single bulb prevent gas leakage and optimises control at low dosing fluxes.

Easy replacement of discharge bulb
The discharge bulb does not use a VCR brazed connection between gas inlet and discharge bulb. Competitor units using
a VCR fitting will eventually seize on the gas inlet. The low replacement cost of the DCAX-60 discharge bulb allows an
operator to use optimised material and hole patterns within budget.

Automatic Matching Network (AMN)
AMN as standard ensures stable growth conditions and optimizes power efficiencies.

Ideal for small and large substrates (25-200mm)
The large beam diameter (50mm) makes the DCAX-60 ideal for substrates of 100mm/4” or larger, whilst a small diameter
hole pattern provides a focussed beam for smaller substrates.

Water cooled gas inlet
The DCAX-60 incorporates a unique water-cooled gas inlet, to help contain the plasma in the discharge zone, for high rate
film growth at high powers and gas flux.

Rapid bakeout preparation
DCA, have integrated the mounting of the AMN, for quick and easy removal for system bakeout.

To find out more and receive a brochure and quotation, please contact your local DCA Representative or email


Thinking of a new role?

Our MBE systems business for Semiconductors and Quantum device research is growing and we are seeking new team members.

  • MBE Research Specialists
  • Service & Installation
  • UHV Instrumentation & Systems
  • Software & Electronics
  • Instrument & System Assembly

We have openings for designers, engineers and production technicians across all areas.

Please email your CV to:       

How to Safely Hibernate your Vacuum System

Are you looking to hibernate your DCA Thin Film system during a COVID-19 laboratory closure?   

Here are some steps to think about alongside your own procedures.  Any questions, consult your manual or contact us:

  • Pump down all deposition chambers, transfer chambers and load locks to their base pressure.  This will protect activated filaments such as within RHEED source and ion gauges.
  • Close transfer gate valves.  
  • Purge process gas lines, including MFC and Gas manifold, back to the gas bottle.  If you can leave the lines under Argon, then do so.
  • Water lines should be checked for leaks.
  • Materials in your sources, can degrade over long periods.  Do you need to secure these?   Materials in crackers are a particular concern.

Is there a chance of loss of power?

  • Back-up data on PC

Set up Video Calling and have contact details published in laboratory. 

These simple considerations alongside your own laboratory checklist should ensure that your system is back to being operational as soon as you are.

We hope that you and your families stay healthy.  DCA Instruments: SERVICE & SALES


All New DCAX-60 Atom source for Oxides and Nitrides

Our all new DCAX-60 atom source is now available!

Designed to deliver neutral atomic gas species, for the growth of high-quality compound materials such as; GaN, GaInNAs, InGaN, InN, ultra-thin Al2O3 and high-K dielectrics.  As a result of having a 50mm beam diameter DCAX-60 is ideal for research of:

Nitride and Oxide MBE growth

Atomic Hydrogen surface treatments

Reactive Gas generation for UHV Sputtering and PLD applications.


Control is nothing without Precision

A recent delivery of a Thin Film cluster tool for an EU based customer, with precision sample handling demands has allowed us to demonstrate rapid and reliable sample transfer, followed by growth recipes and manipulation.   Why not view our LinkedIn channel, to see the movie?   Built to improve productivity, QCM motion, sample indexing and flipping are all precise, reliable and fast.




#APSMarch in the “Mile High City”

APS March Meeting 2020: March 2-6  #APSMarch

Booth: #647

Colorado Convention Center, 700 14th St, Denver, CO 80202, USA

Join us for one of the largest and most exciting events in the Physics conference calendar.  Denver convention centre is always a great location for a wide variety of sessions.  Wall to wall sunshine is usually guaranteed in Denver and the imposing Rocky Mountains are always part of the skyline.

Meet DCA Instruments and our research customers throughout the event.  Exciting sessions to watch out for include:

A41: 2D Magnetic Materials

A60: Topological Materials: Thin Films and Hybrid Structures

J52: Oxide Films, Surfaces and Interfaces

M48: Superconductivity: Materials, Growth, Structure

Join us in the Alps at SAOG 2020


Haute école d’ingénierie et d’architecture
Bd de Pérolles 80, CH-1705 Fribourg, Switzerland

A popular meeting for researchers from across Austria and Switzerland, DCA Instruments are proud to be supporting this event for 2020.   This years invited speakers are:

Angelika Kühnle, U Bielefeld, Germany – Mobilisation on Cooling

Edmondo Benetti, Empa, St. Gallen, Switzerland – A momentum space perspective of metal-organic hybrid interfaces

Martin Aeschlimann, U Kaiserslautern, Germany – Chemical and topological evolution of polymer interfaces 

Sylvia Ceyer, MIT, Cambridge, USA – Reactions at surfaces: delving below and beyond