Our all new DCAX-60 atom source is now available!
Designed to deliver neutral atomic gas species, for the growth of high-quality compound materials such as; GaN, GaInNAs, InGaN, InN, ultra-thin Al2O3 and high-K dielectrics. As a result of having a 50mm beam diameter DCAX-60 is ideal for research of:
Nitride and Oxide MBE growth
Atomic Hydrogen surface treatments
Reactive Gas generation for UHV Sputtering and PLD applications.